Fabrication of Discrete Track Media by Cr Ion Implantation

被引：6

作者：

Hinoue, Tatsuya ^{[1
]}

Ono, Toshinori ^{[1
]}

Inaba, Hiroshi ^{[2
]}

Iwane, Tomohiro ^{[1
]}

Yakushiji, Hiroshi ^{[1
]}

Chayahara, Akiyoshi ^{[3
]}

机构：

[1] Hitachi Ltd, Cent Res Lab, Odawara, Kanagawa 2568510, Japan

[2] Hitachi Ltd, Prod Engn Res Lab, Yokohama, Kanagawa 2440817, Japan

[3] Natl Inst Adv Ind Sci & Technol, Ikeda, Osaka 5638577, Japan

来源：

IEEE TRANSACTIONS ON MAGNETICS | 2010年 / 46卷 / 06期

关键词：

Discrete track media; ion implantation; perpendicular recording; plane surface; MAGNETIC-PROPERTIES; GALLIUM IRRADIATION; PERPENDICULAR MEDIA; CO/PT MULTILAYERS; DENSITY; BEAM;

D O I：

10.1109/TMAG.2010.2043416

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Discrete track media were successfully fabricated by Cr ion implantation. The saturation magnetization of the CoCrPt-SiO(2) perpendicular recording layer was decreased down to 6% by implanting Cr ions with a dosage of 1 x 10(17) ions/cm(2) and an ion energy of 20 keV. A resist mask with a discrete track pattern was prepared by e-beam lithography and the pattern was transferred to the recording layer by Cr ion implantation. A clear magnetic contrast of the tracks was observed and the average surface roughness was maintained less than 1 nm. A clear servo signal was obtained by spin-stand measurement using a flying head. Feasibility of discrete track media fabrication by Cr ion implantation was confirmed.

引用

页码：1584 / 1586

页数：3

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