Epitaxial growth of Bi2Sr2-xLaxCuO6+δ thin films by RF-magnetron sputtering

被引：10
作者：
Zhang, YZ
Li, L
Yang, DG
Zhao, BR
Chen, H
Dong, C
Tao, HJ
Yang, HT
Jia, SL
Yin, B
Li, JW
Zhao, ZX
机构：
[1] Chinese Acad Sci, Inst Phys, Natl Lab Superconduct, Beijing 100080, Peoples R China
[2] Chinese Acad Sci, Ctr Condensed Matter Phys, Beijing 100080, Peoples R China
来源：
PHYSICA C | 1998年 / 295卷 / 1-2期
关键词：
D O I：
10.1016/S0921-4534(97)01719-X
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Superconducting Bi2Sr2-xLaxCuO6+delta thin films were successfully deposited on (100) LaAlO3 and (100) SrTiO3 substrates by in situ RF-magnetron sputtering. The highest zero resistance temperature T-c0, reached 29 K. The film morphology is shown to be related with the sputtering gas pressure. The microstructures. of the films show ab-twinning. Atomic force microscopy image showed the films grow as terrace islands with no screw dislocation. For obtaining high quality La-2201 superconducting thin films, the sputtering gas pressure should be higher, and the compositions of the targets have to be modified by trial and error. (C) 1998 Elsevier Science B.V.
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页码：75 / 79
页数：5
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