Dependence of DC and RF characteristics on gate length for high current AlGaN/GaN HFETs

被引:11
作者
Ping, AT [1 ]
Khan, MA
Chen, Q
Yang, JW
Adesida, I
机构
[1] Univ Illinois, Microelect Lab, Urbana, IL 61801 USA
[2] Univ Illinois, Dept Elect & Comp Engn, Urbana, IL 61801 USA
[3] APA Opt Inc, Blaine, MN 55449 USA
关键词
field effect transistors; gallium nitride;
D O I
10.1049/el:19970702
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The fabrication and performance of AlGaN/GaN heterostructure field-effect transistors of various gale lengths are reported. The unity current gain cutoff frequency (f(t)), maximum frequency of oscillation (f(max)), and threshold voltage are investigated against gate length. The measured f(t) and f(max) values ranged from 37 and 81GHz to 11 and 31GHz for the 0.25 and 1 mu m gate length devices, respectively. These devices also exhibited drain currents as high as 1A/mm.
引用
收藏
页码:1081 / 1083
页数:3
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