Transient Temperature Field Analysis of Thyristor Turn-on Process under Narrow Pulse Width and Large Current

被引:1
作者
Wu, Jin [1 ]
Fu, Xue [1 ]
Lei, Ran [1 ]
Liu, Siqi [1 ]
Wang, Shuai [1 ]
Zhao, Yinan [2 ]
机构
[1] Navy Univ Engn, Sch Elect Engn, Naval Univ Engn, Wuhan 430000, Hubei, Peoples R China
[2] Soochow Univ, Sch Wenzfheng, Suzhou 215000, Peoples R China
来源
2018 4TH INTERNATIONAL CONFERENCE ON ENVIRONMENTAL SCIENCE AND MATERIAL APPLICATION | 2019年 / 252卷
关键词
D O I
10.1088/1755-1315/252/3/032069
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thyristor will damage because of local overheating under narrow pulse width and large inrush current, if the selection is unreasonable. In this paper, the thermal field model of thyristor opening process is established and the transient temperature field distribution of thyristor is obtained by simulation. Simulation results show that under the narrow pulse width and large current, the temperature distribution on the silicon chip is not uniform, the temperature at the center gate is the highest, and the temperature is gradually decreased from the center point along the radius. The effect of current rise rate and chip radius on thyristor temperature distribution are simulated. Simulation results show that the higher the current rise rate, the higher the temperature of the thyristor center gate. The effect of chip radius on thyristor temperature is related to the pulse width of large inrush current. When the chip radius is smaller than the extended radius corresponding to the current pulse width, the smaller the radius, the higher the maximum temperature rise. When the radius of the chip is equal to or greater than the extended radius corresponding to the current pulse width, increasing the radius of the chip has no effect on the highest temperature rise.
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页数:10
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