Characteristic of diffractive optical element for arbitrary pattern beam shaping

被引:4
作者
Hirai, T [1 ]
Fuse, K [1 ]
Kurisu, K [1 ]
Ebata, K [1 ]
Matsushima, K [1 ]
机构
[1] Sumitomo Elect Ind Ltd, Elect & Mat R&D Labs, Konohana Ku, Osaka 5540024, Japan
来源
FIFTH INTERNATIONAL SYMPOSIUM ON LASER PRECISION MICROFABRICATION | 2004年 / 5662卷
关键词
DOE; beam homogenizer; Fourier optics; IFTA; photolithography;
D O I
10.1117/12.596369
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Laser materials processing has been used increasingly over the wide area of electronic industries, especially for drilling microvias in printed circuit boards, and poly-silicon annealing for thin film transistor of liquid crystal display. Intensity distribution of laser beam is usually a non-uniform gaussian profile. Therefore, the demand for uniform intensity distribution is rising rapidly in some applications of heat processing. To obtain higher uniformity, beam homogenizer of a diffractive optical element (DOE) has recently been developed and introduced to some promising applications. Through the improvement of optical design algorithms and micro-fabrication techniques of a phase pattern of DOE, it becomes possible to convert a non-uniform gaussian distribution not only into a simple distribution like a square and a line but also into a complicated distribution like a distribution of printed circuit pattern. In this study, we introduce a design and fabrication result of beam shaper of DOE that can convert a gaussian distribution into the distribution of a printed circuit pattern, and present the possibility and the point at issue of new laser material processing by using such optics.
引用
收藏
页码:378 / 383
页数:6
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