Advanced materials for 193-nm resists

被引：11

作者：

Ushirogouchi, T ^{[1
]}

Asakawa, K ^{[1
]}

Shida, N ^{[1
]}

Okino, T ^{[1
]}

Saito, S ^{[1
]}

Funaki, Y ^{[1
]}

Takaragi, A ^{[1
]}

Tsutsumi, K ^{[1
]}

Nakano, T ^{[1
]}

机构：

[1] Toshiba Corp, Ctr Corp Res & Dev, Adv Mat & Devices Labs, Saiwai Ku, Kawasaki, Kanagawa 2108582, Japan

来源：

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2 | 2000年 / 3999卷

关键词：

193-nm resist; alicyclic; synthesis; polar groups; solubility parameter; adamantane; lacton; acrylate;

D O I：

10.1117/12.388279

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Acrylate monomers containing alicyclic side chains featuring a series of polar substituent groups were assumed to be model compounds. Solubility parameters were calculated for the corresponding acrylate polymers. These acrylate monomers were synthesized using a novel aerobic oxidation reaction employing N-hydroxyphtalimide(NHPI) as a catalyst and then polymerized. These reactions were confirmed to be applicable for the mass-production of those compounds. The calculation results agreed with the hydrophilic parameters measured experimentally. Moreover the relationship between the resist performance and the above-mentioned solubility parameter has been studied. Rs a result, a correlation between the resist performance and the calculated solubility parameter was observed. Finally, resolution of 0.13-micron patterns based on the 1G DRAM design rule, could be successfully fabricated by optimizing the solubility parameter and the resist composition.

引用

页码：1147 / 1156

页数：8

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