Patterning at the nanoscale: Atomic force microscopy and extreme ultraviolet interference lithography

被引：7
作者：
Parisse, P. [1 ]
Luciani, D.
D'Angelo, A.
Santucci, S. [1 ]
Zuppella, P. [2 ]
Tucceri, P. [2 ]
Reale, A. [2 ]
Ottaviano, L.
机构：
[1] Univ Aquila, CASTI, CNR, INFM,Reg Lab, I-67010 Laquila, Italy
[2] Univ Aquila, Dept Phys, gc LNGS INFN, I-67010 Laquila, Italy
来源：
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2009年 / 165卷 / 03期
关键词：
Nanolithography; Atomic force microscopy; Extreme ultraviolet laser;
D O I：
10.1016/j.mseb.2009.07.003
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We present our recent results achieved using atomic force microscopy nano-oxidation and nano-indentation of thin layers of polymers, and using extreme ultraviolet interference lithography. We focus our attention on the advantages and drawbacks of Such lithographic techniques. In particular, we show the possibility to create patterns on polymers compatible with the conventional metal deposition and lift-off processes on submicrometer scale (EUV-IL and nano-indentation) and we experimentally confirm the theoretical prediction on the strong dependence of the oxidation process to the sample conductivity. (c) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码：227 / 230
页数：4
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