Resistive Switching in Nanogap Systems on SiO2 Substrates

被引:68
作者
Yao, Jun [5 ,6 ]
Zhong, Lin [1 ,2 ]
Zhang, Zengxing [3 ]
He, Tao [3 ]
Jin, Zhong [3 ]
Wheeler, Patrick J. [4 ]
Natelson, Douglas [1 ,4 ]
Tour, James M. [2 ,3 ]
机构
[1] Rice Univ, Dept Elect & Comp Engn, Houston, TX 77005 USA
[2] Rice Univ, Dept Comp Sci, Houston, TX 77005 USA
[3] Rice Univ, Dept Chem, Houston, TX 77005 USA
[4] Rice Univ, Dept Phys & Astron, Houston, TX 77005 USA
[5] Rice Univ, Appl Phys Program, Rice Quantum Inst, Houston, TX 77005 USA
[6] Rice Univ, Dept Bioengn, Houston, TX 77005 USA
基金
美国国家科学基金会;
关键词
carbon nanotubes; nanogaps; nonvolatile memory; resistive switching; SiO2; ELECTRICAL BREAKDOWN; CARBON NANOTUBES; THIN-FILM; CONDUCTION; SIO2-FILMS; MEMORIES; BEHAVIOR; PHASE;
D O I
10.1002/smll.200901100
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Voltage-con trolled resistive switching in various gap systems on SiO2 substrates is reported. The nanoscale-sized gaps are made by several means using different materials including metals, semiconductors, and amorphous carbon. The switching site is further reduced in size by using multiwalled carbon nanotubes and single-walled carbon nanotubes. The switching in all the gap systems shares the same characteristics. This independence of switching on the material compositions of the electrodes, accompanied by observable damage to the SiO2 substrate at the gap region, bespeaks the intrinsic switching from post-breakdown SiO2. It calls for caution when studying resistive switching in nanosystems on oxide substrates, since oxide breakdown extrinsic to the nanosystem can mimic resistive switching. Meanwhile, the high ON/OFF ratio (approximate to 10(5)) fast switching time (2 mu s, tested limit), and durable cycles show promising memory properties. The observed intermediate states reveal the filamentary nature of the switching.
引用
收藏
页码:2910 / 2915
页数:6
相关论文
共 30 条
[21]   NEW CONDUCTION AND REVERSIBLE MEMORY PHENOMENA IN THIN INSULATING FILMS [J].
SIMMONS, JG ;
VERDERBER, RR .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1967, 301 (1464) :77-+
[22]   Lithographic Graphitic Memories [J].
Sinitskii, Alexander ;
Tour, James M. .
ACS NANO, 2009, 3 (09) :2760-2766
[23]   Graphene-Based Atomic-Scale Switches [J].
Standley, Brian ;
Bao, Wenzhong ;
Zhang, Hang ;
Bruck, Jehoshua ;
Lau, Chun Ning ;
Bockrath, Marc .
NANO LETTERS, 2008, 8 (10) :3345-3349
[24]   Switching the electrical resistance of individual dislocations in single-crystalline SrTiO3 [J].
Szot, K ;
Speier, W ;
Bihlmayer, G ;
Waser, R .
NATURE MATERIALS, 2006, 5 (04) :312-320
[25]   ENHANCED FORMING IN AL-SIOX-AU STRUCTURES UNDER PULSED BIAS [J].
THURSTAN.RE ;
WILD, PC ;
OXLEY, DP .
THIN SOLID FILMS, 1974, 20 (02) :281-286
[26]   Nanoionics-based resistive switching memories [J].
Waser, RaineR ;
Aono, Masakazu .
NATURE MATERIALS, 2007, 6 (11) :833-840
[27]   New charge-transfer salts for reversible resistive memory switching [J].
Weitz, Ralf Thomas ;
Walter, Andreas ;
Engl, Reimund ;
Sezi, Recai ;
Dehm, Christine .
NANO LETTERS, 2006, 6 (12) :2810-2813
[28]   SURFACE 2ND-HARMONIC GENERATION FROM METAL ISLAND FILMS AND MICROLITHOGRAPHIC STRUCTURES [J].
WOKAUN, A ;
BERGMAN, JG ;
HERITAGE, JP ;
GLASS, AM ;
LIAO, PF ;
OLSON, DH .
PHYSICAL REVIEW B, 1981, 24 (02) :849-856
[29]   Memristive switching mechanism for metal/oxide/metal nanodevices [J].
Yang, J. Joshua ;
Pickett, Matthew D. ;
Li, Xuema ;
Ohlberg, Douglas A. A. ;
Stewart, Duncan R. ;
Williams, R. Stanley .
NATURE NANOTECHNOLOGY, 2008, 3 (07) :429-433
[30]   Etching-dependent reproducible memory switching in vertical SiO2 structures [J].
Yao, Jun ;
Zhong, Lin ;
Natelson, Douglas ;
Tour, James M. .
APPLIED PHYSICS LETTERS, 2008, 93 (25)