Thin film of guest-free type-II silicon clathrate on Si(111) wafer

被引:30
作者
Kume, Tetsuji [1 ]
Ohashi, Fumitaka [1 ]
Sakai, Kentaro [2 ]
Fukuyama, Atsuhiko [3 ]
Imai, Motoharu [4 ]
Udono, Haruhiko [5 ]
Ban, Takayuki [1 ]
Habuchi, Hitoe [6 ]
Suzuki, Hidetoshi [3 ]
Ikari, Tetsuo [3 ]
Sasaki, Shigeo [1 ]
Nonomura, Shuichi [1 ]
机构
[1] Gifu Univ, Fac Engn, 1-1 Yanagido, Gifu 50111, Japan
[2] Miyazaki Univ, Ctr Collaborat Res & Community Cooperat, 1-1 Gakuen Kibanadai Nishi, Miyazaki, Japan
[3] Miyazaki Univ, Fac Engn, 1-1 Gakuen Kibanadai Nishi, Miyazaki 88921, Japan
[4] Natl Inst Mat Sci, Tsukuba, Ibaraki 3050047, Japan
[5] Ibaraki Univ, Grad Sch Sci & Engn, Hitachi, Ibaraki 3168511, Japan
[6] Gifu Coll, Natl Inst Technol, Dept Elect & Comp Engn, Kamimakuwa 2236-2, Motosu, Gifu 5010495, Japan
基金
日本科学技术振兴机构;
关键词
Si clathrate; Photovoltaic response; TEM observation; Thin film; ELECTRICAL-RESISTIVITY; CRYSTALLINE SILICON; SI; SCATTERING; NASI; FORM;
D O I
10.1016/j.tsf.2016.03.056
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of guest-free type-II Si clathrate (Si-136) were fabricated on Si(111) wafers in two steps: NaxSi136 thin-film formation by thermal decomposition of NaSi precursor films and Na removal from the NaxSi136 film by a heat treatment with iodine. Cross-sectional TEM observation and XRD and Raman measurements verified the formation of 1-mu m-thick Si-136 films on the Si wafer. Since the prepared films showed n-type conduction, pn junction devices were developed by a Si136/p-type Si structure. This device showed a photovoltaic (PV) response under white light illumination. The thin film formation and the PV response of Si136 indicated this Si allotrope to be the next-generation platform for semiconductor technology. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:30 / 34
页数:5
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