Fabrication and characterization of self supporting 48Ti thin films

Fabrication of self-supporting 48Ti films of thickness asymptotic to 500 mu g/cm(2) using 100 mg of the material by electron beam evaporation technique in a high vacuum environment has been discussed. A simple and novel method of slowly evaporating the enriched material has been adopted in contrast to complex setup modifications utilized in earlier studies. Various techniques employed for successful fabrication of thin films have been discussed. The thickness measurements and characterizations of fabricated thin films have been carried out using advanced techniques viz., alpha-transmission method, Rutherford Backscattering Spectrometry (RBS), Energy Dispersive Xray Spectrometry (EDS), Field Emission Scanning Electron Microscopy (FE-SEM), and Energy Dispersive X-ray Fluorescence (EDXRF). One of the fabricated targets has successfully been used in nuclear physics experiments.