Effect of Induced Anisotropy on Magnetoimpedance Behaviour of Electrodeposited NiFe/ITO/Glass Films

被引：0

作者：

Sankar, Sumalatha ^{[1
]}

Srinivas, V ^{[1
]}

机构：

[1] Indian Inst Technol Madras, Dept Phys, Chennai 600036, Tamil Nadu, India

来源：

DAE SOLID STATE PHYSICS SYMPOSIUM 2019 | 2020年 / 2265卷

关键词：

RIBBONS;

D O I：

10.1063/5.0017205

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

NiFe films electrodeposited on Indium Tin Oxide (ITO) film coated on glass substrate. The NiFe films were electrodeposited at a current density of 19 mA/cm(2). magnetoimpedance (MI) studies were carried out, it was observed that the MI values were increased from 2.8% to 120% and the MImax value shifted to lower frequency when thickness of the NiFe film increased. It clearly shows that thickness and conductivity of the substrate plays a significant role on MI values. A numerical-simulation conducted by Matlab, indicating the importance of the damping factor(alpha).

引用

页数：4

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