Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition

被引：50

作者：

Vitchev, Roumen ^{[1
]}

Malesevic, Alexander ^{[1
,2
]}

Petrov, Roumen H. ^{[3
]}

Kemps, Raymond ^{[1
]}

Mertens, Myrjam ^{[1
]}

Vanhulsel, Annick ^{[1
]}

Van Haesendonck, Chris ^{[2
]}

机构：

[1] VITO Mat, Flemish Inst Technol Res, BE-2400 Mol, Belgium

[2] Katholieke Univ Leuven, Lab Solid State Phys & Magnetism, BE-3001 Louvain, Belgium

[3] Univ Ghent, Dept Mat Sci & Engn, BE-9052 Ghent, Belgium

来源：

NANOTECHNOLOGY | 2010年 / 21卷 / 09期

关键词：

CARBON NANOTUBES; FILMS;

D O I：

10.1088/0957-4484/21/9/095602

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A promising method for the production of few-layer graphene (FLG) is microwave plasma-enhanced chemical vapour deposition (MW PECVD). However, the growth mechanism of PECVD-synthesized FLG is not completely understood. The aim of this work was to investigate the initial stages of the growth process of FLG deposited by MW PECVD on several substrates (quartz, silicon, platinum). The deposited thin films were characterized by angle-resolved x-ray photoelectron spectroscopy (ARXPS), electron backscattered diffraction (EBSD), scanning electron microscopy (SEM) and x-ray diffraction (XRD). It was found that the initial stages of the deposition were different for the three chosen substrate materials. However, the fully grown FLG layers were similar for all substrates.

引用

页数：7

共 14 条

[1]

Briggs D., 1990, PRACTICAL SURFACE AN, V1, P151

[2] The effect of ion energy on the chemistry of air-aged polymer films grown from the hyperthermal polyatomic ion Si2OMe5+ [J].

Brookes, PN ;

Fraser, S ;

Short, RD ;

Hanley, L ;

Fuoco, E ;

Roberts, A ;

Hutton, S .

JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2001, 121 (1-3) :281-297

[3] Interaction, growth, and ordering of epitaxial graphene on SiC{0001} surfaces: A comparative photoelectron spectroscopy study [J].

Emtsev, K. V. ;

Speck, F. ;

Seyller, Th. ;

Ley, L. ;

Riley, J. D. .

PHYSICAL REVIEW B, 2008, 77 (15)

[4] A chemical route to graphene for device applications [J].

Gilje, Scott ;

Han, Song ;

Wang, Minsheng ;

Wang, Kang L. ;

Kaner, Richard B. .

NANO LETTERS, 2007, 7 (11) :3394-3398

[5] Formation of vertically aligned carbon nanotubes by dual-RF-plasma chemical vapor deposition [J].

Hirao, T ;

Ito, K ;

Furuta, H ;

Yap, YK ;

Ikuno, T ;

Honda, S ;

Mori, Y ;

Sasaki, T ;

Oura, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2001, 40 (6B) :L631-L634

[6]

King RC, 1992, PerkinElmer Corp., V40, P221

[7] Synthesis of few-layer graphene via microwave plasma-enhanced chemical vapour deposition [J].

Malesevic, Alexander ;

Vitchev, Roumen ;

Schouteden, Koen ;

Volodin, Alexander ;

Zhang, Liang ;

Van Tendeloo, Gustaaf ;

Vanhulsel, Annick ;

Van Haesendonck, Chris .

NANOTECHNOLOGY, 2008, 19 (30)

[8] Two-dimensional atomic crystals [J].

Novoselov, KS ;

Jiang, D ;

Schedin, F ;

Booth, TJ ;

Khotkevich, VV ;

Morozov, SV ;

Geim, AK .

PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 2005, 102 (30) :10451-10453

[9] Electric field effect in atomically thin carbon films [J].

Novoselov, KS ;

Geim, AK ;

Morozov, SV ;

Jiang, D ;

Zhang, Y ;

Dubonos, SV ;

Grigorieva, IV ;

Firsov, AA .

SCIENCE, 2004, 306 (5696) :666-669

[10] X-ray photoelectron spectroscopy characterisation of high-k dielectric Al2O3 and HfO2 layers deposited on SiO2/Si surface [J].

Vitchev, RG ;

Pireaux, JJ ;

Conard, T ;

Bender, H ;

Wolstenholme, J ;

Defranoux, C .

APPLIED SURFACE SCIENCE, 2004, 235 (1-2) :21-25

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