Influence of high nitrogen flux on crystal quality of plasma-assisted MBE grown GaN layers using raman spectroscopy: Part-II

被引:0
作者
Asghar, M. [1 ]
Hussain, I. [1 ]
Din, Islah u [1 ]
Saleemi, F. [2 ]
机构
[1] Islamia Univ Bahawalpur, Dept Phys, Bahawalpur, Pakistan
[2] LCUW, Dept Phys, Lahore, Pakistan
来源
SOLID STATE SCIENCE AND TECHNOLOGY | 2007年 / 909卷
关键词
III-V semiconductors; doping; defects; Raman spectroscopy; SIMS;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated lattice properties of plasma assisted MBE grown hexagonal GaN layers at varying nitrogen and gallium fluxes using Raman spectroscopy. Room temperature Raman spectra of Ga-rich layers and stoichiometric GaN are similar showing excitation modes at 434 cm(-1), 567 cm(-1) and 729 cm(-1) identified as residual laser line, E-2(H) and A(1)(LO) mode, respectively. Similarity of Ga-rich and stoichiometric GaN layers is interpreted as the indication of comparable crystal quality of both GaN layers. In contrast, Raman scattering associated with N-rich GaN samples mere exhibit a broad band of excitations in the range of 250-650cm(-1) leaving out A(1)(LO) mode. This typical observation along with intensity distribution of the peaks, is correlated with rough surface, bad crystal quality and high concentration of defects. Based on atomic displacement scheme, the broad band is identified as Ga- vacancies.
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页码:105 / +
页数:2
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