Characteristics improvement of metalorganic chemical vapor deposition grown MgZnO films by MgO buffer layers

被引:10
|
作者
Kim, Dong Chan [1 ]
Kong, Bo Hyun [1 ]
Ahn, Cheol Hyoun [1 ]
Cho, Hyung Koun [1 ]
机构
[1] Sungkyunkwan Univ, Sch Adv Mat Sci & Engn, Suwon 440746, Gyeonggi Do, South Korea
关键词
Zinc oxide; Optoelectronic devices; MOCVD; Luminescence; MOLECULAR-BEAM EPITAXY; ROOM-TEMPERATURE; QUANTUM-WELLS; ZNO; SAPPHIRE;
D O I
10.1016/j.tsf.2009.03.233
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
MgZnO films with a small quantity of Mg were grown on c-sapphire substrates coated with a thin MgO buffer layers by metalorganic chemical vapor deposition. The MgO buffer layer causes improvement in the structural, optical, and electrical properties of subsequently deposited MgZnO thin films, when compared to MgZnO films deposited without a buffer layer. The MgZnO films with a MgO buffer layer grown at 330 degrees C showed the best performance. Transmission electron microscopy revealed that the cubic phase MgO buffer layer promoted the epitaxial behavior of MgZnO, where the planar relationships of the wurtzite-MgZnO/cubic-MgO/sapphire heterostructures mainly were MgZnO(0001)//MgO(001)//sapphire(0001) and MgZnO(1 (1) over bar 00)//MgO(110)// sapphire(11 (2) over bar0). It resulted in lower lattice mismatch between MgO and MgZnO by domain epitaxy of 2/1 and enhancement in preferred growth of the MgZnO films along the c-axis. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码:1185 / 1189
页数:5
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