State of the Art Optical Materials for Lithographic Systems for Semiconductor Manufacturing

被引：0

作者：

Takke, Ralf ^{[1
]}

Kuehn, Bodo ^{[1
]}

Thomas, Stephan ^{[1
]}

机构：

[1] Heraeus Quarzglas GmbH & Co KG, Div Opt, Quarzstr 8, D-63450 Hanau, Germany

来源：

2014 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2014年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

193nm lithography has enabled semiconductor manufacturing to achieve nm resolution. Highest quality optical materials and optics are an essential part of this. Important optical properties of and test methods for these materials will be reported.

引用

页数：1