Orientation and charge transfer upon adsorption of ethanethiol on Cu(111) surface at 85 K

被引：12

作者：

Sardar, SA ^{[1
]}

Syed, JA

Ikenaga, E

Yagi, S

Sekitani, T

Wada, S

Taniguchi, M

Tanaka, K

机构：

[1] Hiroshima Univ, Dept Phys Sci, Higashihiroshima 7398526, Japan

[2] Hiroshima Univ, Ctr Synchrotron Radiat, Higashihiroshima 7398526, Japan

[3] Nagoya Univ, Dept Crystalline Mat Sci, Nagoya, Aichi 4648603, Japan

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2003年 / 199卷

关键词：

NEXAFS; XPS; ethanethiol; Cu(111); charge transfer;

D O I：

10.1016/S0168-583X(02)01552-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Orientation and charge transfer upon adsorption of ethanethiol on Cu(l 11) surface at 85 K has been investigated by S K-edge near edge X-ray absorption fine structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS) techniques. Exposure-dependent S K-edge NEXAFS identified the monolayer saturation at similar to0.8 L exposure. Polarization-dependent NEXAFS spectra of submonolayer ethanethiol shows that S-C bond is tilted 37 +/- 7degrees from the surface. Temperature-dependent NEXAFS spectra shows that ethyl thiolate starts breaking at 300-350 K and atomic sulfur creates. A significant amount of charge transfer (1.4 electrons) from copper to ethanethiol molecules has measured by S Is XPS technique. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：240 / 243

页数：4

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