Photo-curable organically modified silicate-phosphate alternating copolymer for photonics applications

被引:5
作者
Takahashi, Masahide [1 ,2 ]
Suzuki, Masaru [2 ]
Miyagawa, Yuya [2 ]
Ihara, Rie [1 ,2 ]
Tokuda, Yomei [2 ]
Yoko, Toshinobu [2 ]
Nemoto, Takashi [2 ]
Isoda, Seiji [2 ]
机构
[1] Osaka Prefecture Univ, Dept Mat Sci, Grad Sch Engn, Osaka 5998531, Japan
[2] Kyoto Univ, Inst Chem Res, Kyoto 6110011, Japan
关键词
Photonics materials; Alternating copolymer; Oxo polymer; Organic-inorganic hybrid materials; Organic dye; Rare earth ion; Photo-cure; Soft lithography; Plasmonics; Acid-base reaction; Solventless condensation; LOW-MELTING GLASSES;
D O I
10.1007/s10971-010-2197-6
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Photo-curable vinyl modified silicate-phosphate alternating copolymers were prepared by a direct condensation of organochlorosilane and organophosphoric acid in a solvent-free condition. The obtained copolymers have complete alternating copolymer structure of silicate and phosphate unit, where the main oxo chain consist of -(Si-O-P-O) (n) -network. They exhibited an excellent solubility of ionic species such as ionic organic dyes. It was also demonstrated the photo-reduction of Au+ ions to form Au nano particles for plasmonics applications. Micro patterns were also fabricated by soft lithographic processes. These results indicate that the photo-curable alternating copolymers are one of promising materials for advanced optical information processing devices.
引用
收藏
页码:319 / 324
页数:6
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