A multi-technique study of titanium nitride films deposited via reactive sputter deposition

被引：1
作者：
Walker, CGH
Morton, SA
Charnock, JM
MacLean, EJ
Brown, NMD
机构：
[1] Univ Ulster, Dept Appl Biol & Chem Sci, Surface Sci Lab, Coleraine BT52 1SA, Londonderry, North Ireland
[2] Univ York, Dept Chem, York YO1 5DD, N Yorkshire, England
[3] CLRC Daresbury Lab, DARTS Serv, Warrington WA4 4AD, Cheshire, England
来源：
NITRIDES AND OXYNITRIDES | 2000年 / 325-3卷
关键词：
EXAFS; XRD; XPS; XANES; auger parameter; disorder; CaF2;
D O I：
10.4028/www.scientific.net/MSF.325-326.131
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Titanium nitride films were deposited using reactive magnetron deposition and studied in-situ using Xray Photoelectron Spectroscopy (XPS). The films were then analysed ex-situ using Extended X-ray Absorption Fine Structure (EXAFS) and X-ray diffraction (XRD). The films had a larger degree of disorder at high nitrogen content and this correlated with a more complex structure in the N1s peak as seen by XPS. No evidence for the postulated CaF2 structure for highly nitrided TiN films was found.
引用
收藏
页码：131 / 140
页数：10
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