Graded AlGaN Channel Transistors for Improved Current and Power Gain Linearity

被引:67
作者
Bajaj, Sanyam [1 ]
Yang, Zhichao [1 ]
Akyol, Fatih [1 ]
Park, Pil Sung [2 ]
Zhang, Yuewei [1 ]
Price, Aimee L. [1 ]
Krishnamoorthy, Sriram [1 ]
Meyer, David J. [3 ]
Rajan, Siddharth [1 ]
机构
[1] Ohio State Univ, Dept Elect & Comp Engn, Columbus, OH 43210 USA
[2] Navitas Semicond, El Segundo, CA 90245 USA
[3] Naval Res Lab, Washington, DC 20375 USA
基金
美国国家科学基金会;
关键词
Graded AlGaN; constant f(T); gain linearity; GaN; graded AlGaN; high-electron-mobility transistor (HEMT); polarization-doped field-effect transistor (PolFET); ELECTRON-MOBILITY TRANSISTORS; MOLECULAR-BEAM EPITAXY; OHMIC CONTACTS; HEMTS; F(T);
D O I
10.1109/TED.2017.2713784
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the small-signal high frequency characteristics of highly scaled graded AlGaN channel polarization-doped field-effect transistors (PolFETs) that show constant current gain cutoff frequency (f(T)) and maximum oscillation frequency (f(max)) profiles as a function of current density or gate bias. The device design includes upward and downward Al composition grading to induce a distributed 3-D charge profile, and eliminate abrupt heterojunction band offsets to achieve nonalloyedohmic contacts with low resistance. The highest extrinsic f(T) of 52 GHz and fmax of 67 GHz weremeasured at V-GS = -1.5 V andVDS = 9 V, and constant fT and fmax over wide input voltage (VGS) and output current range (IDS) were achieved.
引用
收藏
页码:3114 / 3119
页数:6
相关论文
共 37 条
[1]   Density-dependent electron transport and precise modeling of GaN high electron mobility transistors [J].
Bajaj, Sanyam ;
Shoron, Omor F. ;
Park, Pil Sung ;
Krishnamoorthy, Sriram ;
Akyol, Fatih ;
Hung, Ting-Hsiang ;
Reza, Shahed ;
Chumbes, Eduardo M. ;
Khurgin, Jacob ;
Rajan, Siddharth .
APPLIED PHYSICS LETTERS, 2015, 107 (15)
[2]   Modeling of high composition AlGaN channel high electron mobility transistors with large threshold voltage [J].
Bajaj, Sanyam ;
Hung, Ting-Hsiang ;
Akyol, Fatih ;
Nath, Digbijoy ;
Rajan, Siddharth .
APPLIED PHYSICS LETTERS, 2014, 105 (26)
[3]   MICROWAVE PERFORMANCE OF GAN MESFETS [J].
BINARI, SC ;
ROWLAND, LB ;
KRUPPA, W ;
KELNER, G ;
DOVERSPIKE, K ;
GASKILL, DK .
ELECTRONICS LETTERS, 1994, 30 (15) :1248-1249
[4]   AlGaN/GaN HEMT With 300-GHz fmax [J].
Chung, Jinwook W. ;
Hoke, William E. ;
Chumbes, Eduardo M. ;
Palacios, Tomas .
IEEE ELECTRON DEVICE LETTERS, 2010, 31 (03) :195-197
[5]   Design of High-Aspect-Ratio T-Gates on N-Polar GaN/AlGaN MIS-HEMTs for High fmax [J].
Denninghoff, Daniel J. ;
Dasgupta, Sansaptak ;
Lu, Jing ;
Keller, Stacia ;
Mishra, Umesh K. .
IEEE ELECTRON DEVICE LETTERS, 2012, 33 (06) :785-787
[6]   Effect of Optical Phonon Scattering on the Performance of GaN Transistors [J].
Fang, Tian ;
Wang, Ronghua ;
Xing, Huili ;
Rajan, Siddharth ;
Jena, Debdeep .
IEEE ELECTRON DEVICE LETTERS, 2012, 33 (05) :709-711
[7]   High-power GaN MESFET on sapphire substrate [J].
Gaquiere, C ;
Trassaert, S ;
Boudart, B ;
Crosnier, Y .
IEEE MICROWAVE AND GUIDED WAVE LETTERS, 2000, 10 (01) :19-20
[8]   Highly doped thin-channel GaN-metal-semiconductor field-effect transistors [J].
Gaska, R ;
Shur, MS ;
Hu, X ;
Yang, JW ;
Tarakji, A ;
Simin, G ;
Khan, A ;
Deng, J ;
Werner, T ;
Rumyantsev, S ;
Pala, N .
APPLIED PHYSICS LETTERS, 2001, 78 (06) :769-771
[9]  
Grundmann M., 2004, BANDENG, DOI [10.1063/1.3666862, DOI 10.1063/1.3666862]
[10]   Realization of wide electron slabs by polarization bulk doping in graded III-V nitride semiconductor alloys [J].
Jena, D ;
Heikman, S ;
Green, D ;
Buttari, D ;
Coffie, R ;
Xing, H ;
Keller, S ;
DenBaars, S ;
Speck, JS ;
Mishra, UK ;
Smorchkova, I .
APPLIED PHYSICS LETTERS, 2002, 81 (23) :4395-4397