The EUV phase-shifting point diffraction interferometer

被引：0

作者：

Naulleau, P ^{[1
]}

Goldberg, KA ^{[1
]}

Lee, SH ^{[1
]}

Chang, C ^{[1
]}

Attwood, D ^{[1
]}

Bokor, J ^{[1
]}

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

来源：

SYNCHROTRON RADIATION INSTRUMENTATION | 2000年 / 521卷

关键词：

D O I：

暂无

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) was developed and implemented at Lawrence Berkeley National Laboratory to meet the significant measurement challenge of characterizing EUV projection lithography optics. The PS/PDI has been in continuous use and under ongoing development since 1996. Here we describe recent improvements made to the interferometer, and we summarize metrology results from state-of-the-art 10x-reduction EUV projection optics.

引用

页码：66 / 72

页数：7

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