Continuous network structure of two-dimensional silica across a supporting metal step edge: An atomic scale study

被引:6
|
作者
Gura, Leonard [1 ]
Tosoni, Sergio [2 ]
Lewandowski, Adrian Leandro [1 ]
Marschalik, Patrik [1 ]
Yang, Zechao [1 ]
Schneider, Wolf-Dieter [1 ]
Heyde, Markus [1 ]
Pacchioni, Gianfranco [2 ]
Freund, Hans-Joachim [1 ]
机构
[1] Max Planck Gesell, Fritz Haber Inst, Faradayweg 4-6, D-14195 Berlin, Germany
[2] Univ Milano Bicocca, Dipartimento Sci Mat, Via R Cozzi 55, Milan, Italy
基金
欧洲研究理事会;
关键词
TOTAL-ENERGY CALCULATIONS; EPITAXIAL GRAPHENE; MATERIALS SCIENCE; NACL FILMS; RU(0001); GROWTH; FORCE; FLAT; LEED; STM;
D O I
10.1103/PhysRevMaterials.5.L071001
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The network structure of a silica bilayer film at a monolayer-bilayer transition and across a supporting metal step edge was studied at the atomic scale by scanning tunneling microscopy. The ring size distribution, ring-ring distances, and height profiles are analyzed across the step edge region. Density functional theory proposes two models to explain the observed network structure: a pinning of the lower layer to the substrate and a carpetlike mode. The results indicate a continuous coverage of the silica bilayer film across the step edge.
引用
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页数:5
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