Chemical vapor deposition of tungsten oxide

被引：0

作者：

Kirss, RU ^{[1
]}

Meda, L ^{[1
]}

机构：

[1] Northeastern Univ, Dept Chem, Boston, MA 02115 USA

来源：

APPLIED ORGANOMETALLIC CHEMISTRY | 1998年 / 12卷 / 03期

关键词：

tungsten trioxide; electrochromism; thin films; chemical vapor deposition (CVD);

D O I：

10.1002/(SICI)1099-0739(199803)12:3<155::AID-AOC688>3.0.CO;2-Z

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

Crystalline and amorphous thin films of tungsten(VI) oxide can be prepared by chemical vapor deposition using a variety of volatile precursors below 500 degrees C. Deposition parameters for preparation of WO3 films from tungsten hexacarbonyl [W(CO)(6)], tungsten hexafluoride (WF6), tungsten ethoxides [W(OEt)(x), x=5, 6] and tetra(allyl)tungsten [W(eta(3)-C3H5)(4)] are summarized. The electrochromic behavior of these films is comparable with that observed for WO3 films prepared by evaporation, sputtering and electrodeposition. (C) 1998 John Wiley & Sons, Ltd.

引用

页码：155 / 160

页数：6

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