Flexible NiO nanocrystal-based resistive memory device fabricated by low-temperature solution-process

被引:18
作者
Yun, Hye-Won [1 ,2 ]
Woo, Ho Kun [1 ]
Oh, Soong Ju [1 ]
Hong, Sung-Hoon [2 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 02841, South Korea
[2] ETRI, ICT Mat & Components Res Lab, Daejeon 34129, South Korea
关键词
Flexible ReRAM; NiO nanocrystal; Low-temperature process; Solution-process; RANDOM-ACCESS MEMORY; ELECTRON-TRANSPORTING LAYERS; SWITCHING MEMORY; PERFORMANCE; MECHANISM;
D O I
10.1016/j.cap.2019.11.019
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, a nickel oxide (NiO) nanocrystal (NC) based flexible resistive memory device is demonstrated at temperature as low as 180 degrees C by ligand exchange process. The fabricated device for flexible application with structure Ni/NiO/Ni on PI substrate exhibits excellent switching characteristics with low set/reset voltages and stable resistance values in both ON and OFF states for over 100 switching cycles of memory operation. Also, this flexible memory device shows stable resistive switching properties under compressive stress with bending radius to 10 mm and consecutive bending cycles. The ReRAM fabricated by a low-temperature solution-process shows potential for next generation flexible electronics.
引用
收藏
页码:288 / 292
页数:5
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