Dynamic plowing nanolithography on polymethylmethacrylate using an atomic force microscope

被引:79
作者
Heyde, M
Rademann, K
Cappella, B
Geuss, M
Sturm, H
Spangenberg, T
Niehus, H
机构
[1] Humboldt Univ, Inst Phys & Theoret Chem, D-10117 Berlin, Germany
[2] Fed Inst Mat Res, D-12200 Berlin, Germany
[3] Humboldt Univ, Inst Phys, D-10117 Berlin, Germany
关键词
D O I
10.1063/1.1326053
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We present dynamic plowing nanolithography on polymethylmethacrylate films, performed with a scan-linearized atomic force microscope able to scan up to 250 mum with high resolution. Modifications of the surface are obtained by plastically indenting the film surface with a vibrating tip. By changing the oscillation amplitude of the cantilever, i.e., the indentation depth, surfaces can be either imaged or modified. A program devoted to the control of the scanning process is also presented. The software basically converts the gray scale of pixel images into voltages used to control the dither piezo driving cantilever oscillations. The advantages of our experimental setup and the dependence of lithography efficiency on scanning parameters are discussed. Some insights into the process of surface modifications are presented. (C) 2001 American Institute of Physics.
引用
收藏
页码:136 / 141
页数:6
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