Impact of Chloride Ions on UV/H2O2 and UV/Persulfate Advanced Oxidation Processes

被引:235
作者
Zhang, Weiqiu [1 ,2 ]
Zhou, Shiqing [3 ]
Sun, Julong [3 ]
Meng, Xiaoyang [1 ,2 ]
Luo, Jinming [1 ,2 ]
Zhou, Dandan [4 ]
Crittenden, John [1 ,2 ]
机构
[1] Georgia Inst Technol, Sch Civil & Environm Engn, Atlanta, GA 30332 USA
[2] Georgia Inst Technol, Brook Byers Inst Sustainable Syst, Atlanta, GA 30332 USA
[3] Hunan Univ, Coll Civil Engn, Dept Water Engn & Sci, Changsha 410082, Hunan, Peoples R China
[4] Northeast Normal Univ, Sch Environm, Changchun 130024, Jilin, Peoples R China
基金
美国国家科学基金会;
关键词
MONTE-CARLO-SIMULATION; SYNTHETIC HUMAN URINE; SULFATE RADICALS; WASTE-WATER; HYDROXYL RADICALS; ACETAMINOPHEN DEGRADATION; RATE CONSTANTS; BENZOIC-ACID; HALIDE-IONS; KINETICS;
D O I
10.1021/acs.est.8b01662
中图分类号
X [环境科学、安全科学];
学科分类号
08 ; 0830 ;
摘要
Chloride ion (Cl-) is one of the most common anions in the aqueous environment. A mathematical model was developed to determine and quantify the impact of Cl- on the oxidization rate of organic compounds at the beginning stage of the UV/persulfate (PS) and UV/H2O2 processes. We examined two cases for the UV/PS process: (1) when the target organic compounds react only with sulfate radicals, the ratio of the destruction rate of the target organic compound when Cl- is present to the rate when Cl- is not present (designated as r(R)(Cl-)/r(R)) is no larger than 1.942%; and (2) when the target organic compounds can react with sulfate radicals, hydroxyl radicals and chlorine radicals, r(R)(Cl-)/r(R), can be no larger than 60%. Hence, Cl- significantly reduces the organic destruction rate in the UV/PS process. In the UV/H2O2 process, we found that Cl- has a negligible effect on the organic contaminant oxidation rate. Our simulation results agree with the experimental results very well. Accordingly, our mathematical model is a reliable method for determining whether Cl- will adversely impact organic compounds destruction by the UV/PS and UV/H2O2 processes.
引用
收藏
页码:7380 / 7389
页数:10
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