Ion-beam reduction of the surface of higher niobium oxide

X-ray photoelectron spectroscopy is used to study the process of reduction of the surface of the higher oxide Nb(2)O(5) upon bombardment with inert gas ions (Ar(+)) and reactive gas ions (O (2) (+) ) with an energy of 1 and 3 keV in high vacuum at room temperature. It is found that, upon bombardment with Ar(+) ions, the lower oxide NbO and the intermediate oxide NbO(2) are formed in the surface layers of the oxide Nb(2)O(5). Bombardment with O (2) (+) ions leads to the formation of an extremely insignificant amount of the intermediate oxide NbO(2) in the surface layers of the oxide Nb(2)O(5). It is revealed that the process of ion-beam reduction of the surface of the oxide Nb(2)O(5) depends on the ion type, dose, and energy of exposure.