Fabrication of ridge waveguides: a new solgel route

被引：36

作者：

Fardad, A

Andrews, M

Milova, G

Malek-Tabrizi, A

Najafi, I

机构：

[1] McGill Univ, Dept Chem, Montreal, PQ H3A 2K6, Canada

[2] Ecole Polytech, Photon Res Grp, Montreal, PQ H3C 3A7, Canada

来源：

APPLIED OPTICS | 1998年 / 37卷 / 12期

关键词：

D O I：

10.1364/AO.37.002429

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Passive ridge waveguides can be deposited on silicon by a solvent-assisted lithographic process incorporating simple mask technology and photosensitive solgel-derived glasses. Thick films (similar to 4 mu m) are dip coated in one step, and channel waveguides and power splitters are imprinted in them by UV light through appropriate masks. Unexposed regions of the glass are removed by soaking of the films in n-propanol. The remaining ridges are then treated at 200 degrees C and planarized with a solgel cladding layer. Circular mode profiles are observed from ridge guides covered with the cladding. The waveguides are characterized with scanning electron microscopy, atomic force microscopy, surface profilometry, ellipsometry, and fiber end coupling. Overall, the procedure is simple and reproducible and leads to waveguides with low loss, of the order of 0.13 dB/cm. (C) 1998 Optical Society of America.

引用

页码：2429 / 2434

页数：6

共 21 条

[1] Auto-embossed Bragg gratings from self-organizing polymers: Chemical tuning of periodicity and photoinduced anisotropy [J].