Convoluted double square: single layer FSS with close band spacings

被引：31

作者：

Chuprin, AD ^{[1
]}

Parker, EA ^{[1
]}

Batchelor, JC ^{[1
]}

机构：

[1] Univ Kent, Dept Elect Engn, Canterbury CT2 7NT, Kent, England

来源：

ELECTRONICS LETTERS | 2000年 / 36卷 / 22期

关键词：

D O I：

10.1049/el:20001308

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel element provides reflection band ratios as low as 1.1. It is derived from the double square but is less demanding on printing definition. Together, the two elements offer increased flexibility in Frequency selective surface design for close band applications. Substrate loss effects are also discussed.

引用

页码：1830 / 1831

页数：2

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