A characterization of the inhibiting effect of Cu on metastable pitting in dilute Al-Cu solid solution alloys

被引:67
作者
Kim, Youngseok [1 ]
Buchheit, Rudolph G. [1 ]
机构
[1] Ohio State Univ, Dept Mat Sci & Engn, Fontana Corros Ctr, Columbus, OH 43210 USA
关键词
aluminum copper; potentiostatic; passivity; pitting corrosion;
D O I
10.1016/j.electacta.2006.08.054
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Copper additions to aluminum decrease susceptibility to pit initiation provided that Cu is retained in solid solution. This can be observed as an increase in pitting potential with increasing Cu content in an alloy. To further understand this effect, metastable pitting of high purity Al, Al-0.2 Cu and Al-2.0Cu exposed to 0.1 M NaCl solutions has been examined in detail. Results show that 0.2 wt.% Cu additions decrease the metastable pit initiation rate by more than an order of magnitude and slow the pit growth rate mainly by decreasing the peak pit current attained. In an Al-2.0 alloy, metastable pitting events were too rare for rigorous study. Repassivation of metastable pits occurs by a two-stage process in Al-0.2 wt.% Cu alloy. The repassivation rate during the first stage is identical to that of high purity Al and appears to be completely unaffected by Cu in the alloy or in the pit solution. In the second stage, repassivation is slow, but is not believed to affect ultimate pit stability. Overall, Cu additions decrease the probability of stable pit formation by decreasing metastable pit initiation and growth rates. (c) 2006 Elsevier Ltd. All rights reserved.
引用
收藏
页码:2437 / 2446
页数:10
相关论文
共 33 条
[1]   The role of precipitates enriched with copper on the susceptibility to pitting corrosion of the 2024 aluminium alloy [J].
Blanc, C ;
Lavelle, B ;
Mankowski, G .
CORROSION SCIENCE, 1997, 39 (03) :495-510
[2]  
BOGER RK, 2000, P 198 EL SOC PHOEN A
[3]   MICROTECHNIQUES AND NANOTECHNIQUES TO STUDY LOCALIZED CORROSION [J].
BOHNI, H ;
SUTER, T ;
SCHREYER, A .
ELECTROCHIMICA ACTA, 1995, 40 (10) :1361-1368
[4]   A COMPILATION OF CORROSION POTENTIALS REPORTED FOR INTERMETALLIC PHASES IN ALUMINUM-ALLOYS [J].
BUCHHEIT, RG .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1995, 142 (11) :3994-3996
[5]   Local dissolution phenomena associated with S phase (Al2CuMg) particles in aluminum alloy 2024-T3 [J].
Buchheit, RG ;
Grant, RP ;
Hlava, PF ;
Mckenzie, B ;
Zender, GL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (08) :2621-2628
[6]   Metastable pitting of carbon steel under potentiostatic control [J].
Cheng, YF ;
Luo, JL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (03) :970-976
[7]   EVOLUTION OF THE CHEMISTRY OF PASSIVE FILMS OF SPUTTER-DEPOSITED, SUPERSATURATED AL-ALLOYS [J].
DAVIS, GD ;
MOSHIER, WC ;
FRITZ, TL ;
COTE, GO .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (02) :422-427
[8]   Dealloying of Al2CuMg in alkaline media [J].
Dimitrov, N ;
Mann, JA ;
Vukmirovic, M ;
Sieradzki, K .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2000, 147 (09) :3283-3285
[9]   THE GROWTH OF 2-D PITS IN THIN-FILM ALUMINUM [J].
FRANKEL, GS .
CORROSION SCIENCE, 1990, 30 (12) :1203-1218
[10]   ON THE PITTING RESISTANCE OF SPUTTER-DEPOSITED ALUMINUM-ALLOYS [J].
FRANKEL, GS ;
NEWMAN, RC ;
JAHNES, CV ;
RUSSAK, MA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1993, 140 (08) :2192-2197