Point defects in lithium fluoride films for micro-radiography, X-ray microscopy and photonic applications

被引:19
作者
Bonfigli, F
Faenov, AY
Flora, F
Marolo, T
Montereali, RM
Nichelatti, E
Pikuz, TA
Reale, L
Baldacchini, G
机构
[1] UTS Tecnol Fis Avanzate, CR Frascati, ENEA, I-00044 Frascati, Rome, Italy
[2] UTS Tecnol Fis Avanzate, CR Casaccia, ENEA, I-00060 St Maria Galeria, Rome, Italy
[3] Univ Aquila, I-67100 Laquila, Italy
[4] Ist Nazl Fis Nucl, Dip Fis, I-67100 Laquila, Italy
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2005年 / 202卷 / 02期
关键词
D O I
10.1002/pssa.200460236
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Point defects in lithium fluoride (LiF) have recently attracted renewed attention due the exciting results obtained in the realisation of miniaturised optical devices. Among light-emitting materials, LiF is of particular interest because it is almost not hygroscopic and can host, even at room temperature, stable color centers (CCs) that emit light in the visible and in the near infrared spectral range under optical excitation. The increasing demand for low-dimensionality photonic devices imposes the use of advanced irradiation methods for producing luminescent structures with high spatial resolution. An innovative irradiation technique to produce luminescent CCs in LiF crystals and films by using an extreme ultra-violet and soft X-ray laser-plasma source will be presented. This technique is capable to induce colored patterns with submicrometric spatial resolution on large areas in a short exposure time as compared with other irradiation methods. Luminescent regular arrays produced by this irradiation technique will be shown. Recently, the idea of using a LiF film as image detector for X-ray microscopy and micro-radiography based on optically-stimulated luminescence from CCs has been developed. (C) 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.
引用
收藏
页码:250 / 255
页数:6
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