Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

被引：74

作者：

Mackus, A. J. M. ^{[1
]}

Mulders, J. J. L. ^{[2
]}

van de Sanden, M. C. M. ^{[1
]}

Kessels, W. M. M. ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

[2] FEI Electron Opt, NL-5651 GG Eindhoven, Netherlands

来源：

JOURNAL OF APPLIED PHYSICS | 2010年 / 107卷 / 11期

关键词：

atomic layer deposition; electron beam deposition; nanofabrication; nanopatterning; nanostructured materials; platinum; PLATINUM;

D O I：

10.1063/1.3431351

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions. (c) 2010 American Institute of Physics. [doi:10.1063/1.3431351]

引用

页数：3

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