Highly stacked InGaAs quantum dot structures grown with two species of As

被引:16
作者
Sugaya, Takeyoshi [1 ]
Amano, Takeru [1 ]
Mori, Masahiko [1 ]
Niki, Shigeru [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Tsukuba, Ibaraki 3058568, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2010年 / 28卷 / 03期
关键词
gallium arsenide; III-V semiconductors; indium compounds; molecular beam epitaxial growth; photoluminescence; semiconductor quantum dots; CRITICAL LAYER THICKNESS;
D O I
10.1116/1.3289124
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors describe successful formation of highly stacked InGaAs quantum dot (QD) structures grown with molecular beam epitaxy. 100-stack InGaAs QDs are grown without using any strain compensation technique or any degradation in crystal quality. InGaAs QDs are aligned in the growth direction and tend to align in the QD plane. As-2-grown multistack InGaAs QD structures have superior optical properties to As-4-grown structures at a high growth rate of 1 mu m/h, whereas the opposite is true at a lower growth rate. The highest and narrowest photoluminescence spectrum is observed in a highly stacked InGaAs QD structure grown with an As-2 source and a high growth rate. (C) 2010 American Vacuum Society. [DOI: 10.1116/1.3289124]
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页数:5
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