Effect of air annealing on dispersive optical constants and electrical properties of SnSb2S4 thin films

被引:21
作者
Fadhli, Y. [1 ]
Rabhi, A. [1 ]
Kanzari, M. [1 ]
机构
[1] Lab Photovolta & Mat Semicond ENIT, Tunis 1002, Tunisia
关键词
SnSb2S4 thin film; Air annealing; Optical properties; Electrical properties; PHOTOVOLTAIC APPLICATIONS; AMORPHOUS SEMICONDUCTORS; STRUCTURAL-PROPERTIES; PHYSICAL-PROPERTIES; VAPOR-DEPOSITION; TEMPERATURE; PHOTOCONDUCTIVITY; CONDUCTIVITY; COMPOUND; BEHAVIOR;
D O I
10.1016/j.mssp.2014.05.002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
SnSb2S4 thin films were prepared by thermal evaporation under vacuum onto no heated glass substrates. The as-deposited films were annealed in air for 1 h in the temperature range 70-350 degrees C. XRD data analysis shows that SnSb2S4 crystallizes in the orthorhombic structure according to a preferential direction (531). The optical properties of thin films were determined, in the spectral range 300-1800 nm, from the analysis of the experimental recorded transmittance and reflectance data. High absorption coefficients (10(5)-10(6) cm(-1)) are reached in the energy range 2-2.5 eV. A decrease in optical band gap from 1.97 to 1.61 eV by increasing the air annealing temperature was observed. The Wemple-DiDomenico single oscillator model was applied to determine the optical constants such as oscillator energy E-0 and dispersion energy E-d of the films after annealing. The electric free carrier susceptibility and the ratio of carrier concentration to the effective mass were estimated according to the model of Spitzer-Fan. The layers annealed at temperatures greater than 200 degrees C undergo abrupt changes in their electrical properties and a hysteresis phenomenon was observed. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:282 / 287
页数:6
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