Spectroscopic ellipsometry and X-ray diffraction studies on Si1-xGex/Si epifilms and superlattices

被引:1
|
作者
Xie, Deng [1 ,2 ,3 ]
Qiu, Zhi Ren [2 ,3 ]
Wan, Lingyu [4 ]
Talwar, Devki N. [5 ]
Cheng, Hung-Hsiang [6 ,7 ]
Liu, Shiyuan [8 ]
Mei, Ting [9 ,10 ]
Feng, Zhe Chuan [4 ]
机构
[1] South China Normal Univ, Inst Optoelect Mat & Technol, Guangzhou 510631, Guangdong, Peoples R China
[2] Sun Yat Sen Univ, State Key Lab Optoelect Mat & Technol, Guangzhou 510275, Peoples R China
[3] Sun Yat Sen Univ, Sch Phys, Guangzhou 510275, Peoples R China
[4] Guangxi Univ, Coll Phys Sci & Technol, Guangxi Key Lab Relativist Astrophys, Lab Optoelect Mat & Detect Technol, Nanning 530004, Peoples R China
[5] Indiana Univ Penn, Dept Phys, 975 Oakland Ave,56 Weyandt Hall, Indiana, PA 15705 USA
[6] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 106, Taiwan
[7] Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 106, Taiwan
[8] Huazhong Univ Sci & Technol, State Key Lab Digital Mfg Equipment & Technol, Wuhan 430074, Hubei, Peoples R China
[9] Northwestern Polytech Univ, Key Lab Space Appl Phys & Chem, Minist Educ, Xian 710072, Shaanxi, Peoples R China
[10] Northwestern Polytech Univ, Shaanxi Key Lab Opt Informat Technol, Sch Sci, Xian 710072, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
Spectroscopic ellipsometry; X-ray diffraction; Silicon germanium; CHEMICAL-VAPOR-DEPOSITION; TEMPERATURE; TETRASILANE; SILICON; EPITAXY; ALLOYS; SIGE;
D O I
10.1016/j.apsusc.2017.03.066
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Comprehensive optical and structural properties are reported on several MBE grown thin Si1-xGex epifilms and Si1-xGex/Si superlattices with low Ge contents by using spectroscopic ellipsometry (SE), high resolution x-ray diffraction (HR-XRD) and Raman scattering (RS). For thin Si1-xGex films, our appraised results of the optical dielectric functions from SE spectra fitted to the parameterized models have revealed discrepancies with the existing data. While E-1 and E-1 + Delta(1) critical point energies have shown similarities, their amplitudes uncovered similar to 25% larger value for the E-1 band-edge, and similar to 10% larger value for the E-1 + Delta(1) band-edge. In our samples, the observed vibrational peaks in the RS are classified as unstrained Si-Si, Ge-Ge and Ge-Si modes. These mode assignments in Si1-xGex alloys are evaluated compared and discussed with the available RS data. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:748 / 754
页数:7
相关论文
共 50 条
  • [1] X-ray diffraction and electron microscopy investigation of porous Si1-xGex
    Buttard, D
    Schoisswohl, M
    Cantin, JL
    vonBardeleben, HJ
    THIN SOLID FILMS, 1997, 297 (1-2) : 233 - 236
  • [2] Photoluminescence and X-ray characterisation of Si/Si1-xGex multiple quantum wells
    Sidiki, TP
    Rühm, A
    Ni, WX
    Hansson, GV
    Torres, CMS
    JOURNAL OF LUMINESCENCE, 1998, 80 (1-4) : 503 - 507
  • [3] Photoluminescence and X-ray characterisation of Si/Si1-xGex multiple quantum wells
    Sidiki, TP
    Rühm, A
    Ni, WX
    Hansson, GV
    Torres, CMS
    LIGHT EMISSION FROM SILICON: PROGRESS TOWARDS SI-BASED OPTOELECTRONICS, 1999, 77 : 503 - 507
  • [4] Annealing of thin Zr films on Si1-xGex(0 ≤ x ≤ 1):: X-ray diffraction and Raman studies
    Chaix-Pluchery, O
    Chenevier, B
    Aubry-Fortuna, V
    Matko, I
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 2002, 63 (10) : 1889 - 1900
  • [5] In situ characterization of thin Si1-xGex films on Si(100) by spectroscopic ellipsometry
    Akazawa, H
    THIN SOLID FILMS, 2000, 369 (1-2) : 157 - 160
  • [6] X-ray scattering investigation of the interfaces in Si/Si1-xGex superlattices on Si(001) grown by MBE and UHV-CVD
    Baribeau, JM
    Lafontaine, H
    THIN SOLID FILMS, 1998, 321 : 141 - 147
  • [7] Growth mode of thin Si1-xGex films on Si (100) monitored by spectroscopic ellipsometry
    Akazawa, H
    JOURNAL OF CRYSTAL GROWTH, 2000, 209 (2-3) : 311 - 314
  • [8] Application of high-resolution X-ray diffraction to study strain status in Si1-xGex/Si1-yGey/Si (001) heterostructures
    Chtcherbatchev, KD
    Sequeira, AD
    Franco, N
    Barradas, NP
    Myronov, M
    Parker, EHC
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 91 : 453 - 456
  • [9] Si1-xGex laterally graded crystals as monochromators for x-ray absorption spectroscopy studies
    Veldkamp, M
    Erko, A
    Gudat, W
    Abrosimov, NV
    Alex, V
    Khasanov, S
    Shekhtman, V
    Neissendorfer, F
    Pietsch, U
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 : 612 - 615
  • [10] X-ray fluorescence holography study on Si1-xGex single crystal
    Hayashi, K
    Takahashi, Y
    Yonenaga, I
    Matsubara, E
    MATERIALS TRANSACTIONS, 2004, 45 (07) : 1994 - 1997