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Dielectric and ferroelectric properties of SrxBa1-xNb2O6 (SBN:x) thin films
被引:7
作者:
Boulay, N.
Cuniot-Ponsard, M.
Desvignes, J. M.
Bellemain, A.
机构:
[1] CNRS, Inst Opt, Lab Charles Fabry, F-91127 Palaiseau, France
[2] Univ Paris Sud, F-91127 Palaiseau, France
来源:
关键词:
SBN thin films;
sputtering;
dielectric non linearity;
ferroelectric properties;
D O I:
10.1080/00150190701367010
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
Thin films of SrxBa1-xNb2O6 (SBN: x) areparticularly attractivefor their potential use as low voltage electro-optic waveguides. This potential application in integrated optics requires the control of the (001) oriented SBN growth on a conductive substrate. We have prepared (001) SBN:x thin films on Pt coated MgO substrates by using sputtering techniques and rapid thermal annealing. The dielectric non linearity of the SBN:x films is investigated as a function of the Sr content (x = 50,60, or 70%) and annealing conditions. It is maximum at theferroelectric-paraelectric transition temperature of the film (175 degrees C, 116 degrees C and 40 degrees C for x = 50, 60, and 70% respectively). At room temperature and with a Sr content of 60%, the relative variation of the dielectric permittivity [epsilon(0)-epsilon(E)]/epsilon(0) is found equal to 46% for an applied electric field E = 43 kV/cm. Due to a transition temperature closer to room temperature, a dielectric non linearity of higher value, less sensitive to temperature and little affected by hysteresis, is expected from films of higher Sr content.
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页码:444 / 454
页数:11
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