On the electrodeposition of tantalum from three different ionic liquids with the bis(trifluoromethyl sulfonyl) amide anion

被引:70
|
作者
Ispas, Adriana [1 ]
Adolphi, Barbara [1 ]
Bund, Andreas
Endres, Frank [2 ]
机构
[1] Tech Univ Dresden, Inst Halbleiter & Mikrosyst Tech, D-01062 Dresden, Germany
[2] Tech Univ Clausthal, Abt Grenzflachenprozesse, D-38678 Clausthal Zellerfeld, Germany
关键词
IN-SITU STM; ELECTROLESS DEPOSITION; METALLIC SILVER; THIN-FILMS; QUARTZ; CHLORIDE; DENSITY; OXIDE; ELECTROPOLYMERIZATION; SPECTROSCOPY;
D O I
10.1039/b922071m
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The electrodeposition of Ta from TaF5 was studied in three different ionic liquids, namely in 1-butyl-1-methylpyrrolidinium bis(trifluoromethyl sulfonyl) amide, 1-ethyl-3-methylimidazolium bis(trifluoromethyl sulfonyl) amide and 1-methyl-3-propyl imidazolium bis(trifluoromethyl sulfonyl) amide. The electrochemical quartz crystal microbalance (EQCM) was used together with electrochemical techniques for characterizing in situ the electrodeposition process. With the help of the EQCM we could identify the stoichiometry of the electrodeposited species. Furthermore, square-wave voltammery was used to study intermediate reduction processes in the potential regime where no mass change was detected. An XPS analysis proved the existence of elemental Ta, besides some oxides and Ta halide species. Both the ionic liquid and the deposition conditions influence strongly the quality and properties of the deposited layers.
引用
收藏
页码:1793 / 1803
页数:11
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