Manipulating Reaction Rates of Metal-Oxide Heterogeneous Catalysts via Semiconductor Heterojunctions

被引:4
作者
Nandakumar, Navaneetha K. [1 ,2 ]
Seebauer, Edmund G. [1 ]
机构
[1] Univ Illinois, Dept Chem & Biomol Engn, Urbana, IL 61801 USA
[2] Maxim Integrated, Dallas, TX 75254 USA
基金
美国国家科学基金会;
关键词
POLYCRYSTALLINE ANATASE TIO2; V2O5; SINGLE-CRYSTALS; THIN-FILMS; METHANOL OXIDATION; CARRIER CONCENTRATION; ELECTRICAL-PROPERTIES; VANADIUM-OXIDES; SURFACE; SUPPORT; MICROSTRUCTURE;
D O I
10.1021/acs.jpcc.8b00712
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Heterojunctions of metal oxide semiconductors enable the manipulation of surface chemistry for heterogeneous catalysts or sensors without introducing dopants and their attendant complications. If one of the semiconductors is sufficiently thin, charge exchange between the two semiconductors leads to charge buildup at the free surface. The excess charge influences the Lewis acid-base character of the surface and propagates into properties such as catalytic activity. Although the available literature offers evidence for such effects, published work does not outline a quantitative framework that links heterojunction behavior to catalytic activity. The present work develops and demonstrates such a framework for the oxidation of methanol to formaldehyde with a heterojunction of thin polycrystalline V2O5 grown on polycrystalline anatase TiO2. The framework accurately reproduces activity changes by a factor of 20 in response to V2O5 thickness and TiO2 donor concentration.
引用
收藏
页码:16655 / 16663
页数:9
相关论文
共 50 条
  • [1] Manipulating Surface Potentials of Metal Oxides Using Semiconductor Heterojunctions
    Nandakumar, Navaneetha K.
    Seebauer, Edmund G.
    JOURNAL OF PHYSICAL CHEMISTRY C, 2016, 120 (10) : 5486 - 5494
  • [2] Manipulating III-V Nanowire Transistor Performance via Surface Decoration of Metal-Oxide Nanoparticles
    Wang, Fengyun
    Yip, SenPo
    Dong, Guofa
    Xiu, Fei
    Song, Longfei
    Yang, Zaixing
    Li, Dapan
    Hung, Tak Fu
    Han, Ning
    Ho, Johnny C.
    ADVANCED MATERIALS INTERFACES, 2017, 4 (12):
  • [3] STUDIES ON METAL-OXIDE SEMICONDUCTOR ZnO AS A HYDROGEN GAS SENSOR
    Prajapati, C. S.
    Sahay, P. P.
    JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2011, 3 (01) : 714 - 720
  • [4] Metal-oxide interactions modulating the activity of active oxygen species on atomically dispersed silver catalysts
    Li, Rongtan
    Liu, Conghui
    Fan, Yamei
    Fu, Qiang
    Bao, Xinhe
    CHEMICAL COMMUNICATIONS, 2023, 59 (26) : 3854 - 3857
  • [5] Metal and Metal Oxide Supported on Ordered Mesoporous Carbon as Heterogeneous Catalysts
    Gao, Meiqi
    Wang, Lili
    Yang, Yang
    Sun, Yafei
    Zhao, Xiaorui
    Wan, Ying
    ACS CATALYSIS, 2023, 13 (07) : 4060 - 4090
  • [6] Exploratory studies on wet oxidation grown ternary hafnium tantalum oxide for metal-oxide semiconductor application
    Lim, Way Foong
    Quah, Hock Jin
    INTERNATIONAL JOURNAL OF ENERGY RESEARCH, 2022, 46 (04) : 4699 - 4711
  • [7] Stable Hydrophobic Metal-Oxide Photocatalysts via Grafting Polydimethylsiloxane Brush
    Wooh, Sanghyuk
    Encinas, Noemi
    Vollmer, Doris
    Butt, Hans-Juergen
    ADVANCED MATERIALS, 2017, 29 (16)
  • [8] Defect-Driven Interfacial Electronic Structures at an Organic/Metal-Oxide Semiconductor Heterojunction
    Winget, Paul
    Schirra, Laura K.
    Cornil, David
    Li, Hong
    Coropceanu, Veaceslav
    Ndione, Paul F.
    Sigdel, Ajaya K.
    Ginley, David S.
    Berry, Joseph J.
    Shim, Jaewon
    Kim, Hyungchui
    Kippelen, Bernard
    Bredas, Jean-Luc
    Monti, Oliver L. A.
    ADVANCED MATERIALS, 2014, 26 (27) : 4711 - +
  • [9] On the importance of metal-oxide interface sites for the water-gas shift reaction over Pt/CeO2 catalysts
    Aranifard, Sara
    Ammal, Salai Cheettu
    Heyden, Andreas
    JOURNAL OF CATALYSIS, 2014, 309 : 314 - 324
  • [10] MOLECULAR DESIGN OF SUPPORTED METAL-OXIDE CATALYSTS - AN INITIAL STEP TO THEORETICAL-MODELS
    WACHS, IE
    DEO, G
    VUURMAN, MA
    HU, HC
    KIM, DS
    JEHNG, JM
    JOURNAL OF MOLECULAR CATALYSIS, 1993, 82 (2-3): : 443 - 455