Effects of energetic particle bombardment on residual stress, microstrain and grain size of plasma-assisted PVD Cr thin films

被引：15

作者：

Hsieh, JH ^{[1
]}

Li, C

Wu, W

Hochman, RF

机构：

[1] Nanyang Technol Univ, Sch MPE, Singapore 639798, Singapore

[2] Natl Chung Hsing Univ, Dept Mat Engn, Taichung 402, Taiwan

[3] Georgia Inst Technol, Sch Mat Engn, Atlanta, GA 30332 USA

来源：

THIN SOLID FILMS | 2003年 / 424卷 / 01期

关键词：

Cr thin films; ion plating; energetic particle bombardment;

D O I：

10.1016/S0040-6090(02)00907-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Residual stress, microstrain and grain size of ion plated Cr films deposited on molybdenum substrates were analyzed and studied. A model based on the effects of incident particle energy and/or momentum on the properties of these films is proposed and discussed. It was concluded that the film properties may be affected by both the momentum and energy transfer of the incident particles, or by either one. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：103 / 106

页数：4

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