Properties of ZnO/Cu/ZnO multilayer films deposited by simultaneous RF and DC magnetron sputtering at different substrate temperatures

被引：31
|
作者：
Sahu, D. R. [1 ]
Huang, Jow-Lay [1 ]
机构：
[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan
来源：
MICROELECTRONICS JOURNAL | 2007年 / 38卷 / 03期
关键词：
TCO; multilayer; sputtering; electrical and optical properties;
D O I：
10.1016/j.mejo.2007.01.012
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
ZnO/Cu/ZnO transparent conductive multilayer films are prepared by simultaneous RF sputtering of ZnO and DC sputtering of Cu. The properties of the multilayer films are studied at different substrate temperatures. Sheet resistance of the multilayer film decreased initially with increase of substrate temperature and increased further with increase of substrate temperature beyond 100 degrees C. However, transmittance of the multilayer film increased with increase of substrate temperature. Good transparent conductive film of sheet resistance 9.3 ohm/sq and transmittance of 85% was found at a substrate temperature of 100 degrees C. The performance of the multilayer film was evaluated using a figure of merit. The observed property of the multilayer film is suitable for the application of transparent conductive electrodes. (C) 2007 Elsevier Ltd. All rights reserved.
引用
收藏
页码：299 / 303
页数：5
相关论文
共 50 条
  • [1] The properties of Ti-doped ZnO films deposited by simultaneous RF and DC magnetron sputtering
    Lin, SS
    Huang, JL
    Sajgalik, P
    SURFACE & COATINGS TECHNOLOGY, 2005, 191 (2-3): : 286 - 292
  • [2] Enhanced photoluminescence properties of Cu-doped ZnO thin films deposited by simultaneous RF and DC magnetron sputtering
    Sreedhar, Adem
    Kwon, Jin Hyuk
    Yi, Jonghoon
    Kim, Jong Su
    Gwag, Jin Seog
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2016, 49 : 8 - 14
  • [3] Properties of boron-doped ZnO thin films deposited by pulsed DC magnetron sputtering at different substrate temperatures
    Wen, B.
    Liu, C. Q.
    Wang, N.
    Wang, H. L.
    Liu, S. M.
    Jiang, W. W.
    Ding, W. Y.
    Fei, W. D.
    Chai, W. P.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2015, 121 (03): : 1147 - 1153
  • [4] Properties of boron-doped ZnO thin films deposited by pulsed DC magnetron sputtering at different substrate temperatures
    B. Wen
    C. Q. Liu
    N. Wang
    H. L. Wang
    S. M. Liu
    W. W. Jiang
    W. Y. Ding
    W. D. Fei
    W. P. Chai
    Applied Physics A, 2015, 121 : 1147 - 1153
  • [5] ZnO films deposited by RF magnetron sputtering
    Li, J
    Wu, ST
    Kang, JY
    SMIC-XIII: 2004 13th International Conference on Semiconducting & Insulating Materials, 2004, : 77 - 80
  • [6] Properties of doped ZnO thin films grown by simultaneous dc and RF magnetron sputtering
    Sahu, D. R.
    MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS, 2010, 171 (1-3): : 99 - 103
  • [7] Effect of substrate temperature on the properties of Ti-doped ZnO films by simultaneous rf and dc magnetron sputtering
    Lin, SS
    Huang, JL
    Lii, DF
    MATERIALS CHEMISTRY AND PHYSICS, 2005, 90 (01) : 22 - 30
  • [8] Al:ZnO films deposited on flexible transparent polyimide substrate by magnetron sputtering at different substrate temperatures
    Li, Weimin
    Hao, Huiying
    OPTOELECTRONICS AND ADVANCED MATERIALS-RAPID COMMUNICATIONS, 2012, 6 (1-2): : 117 - 120
  • [9] Structure of Multilayer ZnO Films Deposited by a Magnetron Sputtering
    Ievtushenko, A. I.
    Karpyna, V. A.
    Lashkaryov, G. V.
    Lazorenko, V. J.
    Baturin, V. A.
    Karpenko, O. Yu.
    Lunika, M. M.
    Puzikov, V. M.
    METALLOFIZIKA I NOVEISHIE TEKHNOLOGII, 2008, 30 (11): : 1511 - 1519
  • [10] Structural evolution of ZnO films deposited by rf magnetron sputtering on glass substrate
    Liao, Yan-Ping
    Zhang, Jian-Hua
    Li, Shu-Xin
    Guo, Zhan-Sheng
    Cao, Jin
    Zhu, Wen-Qing
    Li, Xifeng
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2010, 207 (08): : 1850 - 1853
12345