Fabrication and characterization of silica anti-reflective films with phosphoric acid template

被引：9

作者：

Xie, Qiang ^{[1
]}

Li, Haibin ^{[1
]}

机构：

[1] Shanghai Jiao Tong Univ, Sch Mech Engn, Inst Fuel Cell, Shanghai 200240, Peoples R China

来源：

MATERIALS LETTERS | 2015年 / 138卷

关键词：

Antireflective film; Solar energy materials; Sol-gel preparation; Silica; H3PO4; Porous materials;

D O I：

10.1016/j.matlet.2014.09.111

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work, the feasibility is investigated and confirmed that H3PO4 is used as pore-forming agent in silica antireflective film. The films are prepared by sol-gel method and spinning-coating technique and studied by field-emission scanning electron microscopy (FE-SEM), visible spectroscopy and ellipsometer. The impact of H3PO4 concentration on transmittance is also examined. Transmittance spectra show that silica films feature a marked increase of substrate transmittance almost at all measured wavelengths (325-1000 nm) owing to the addition of H3PO4. With the decrease of H3PO4 concentration, films transmittance will rise first and then decrease slightly. And with an increase of 4.1%, a maximum light transmittance of 95.01% is obtained, which is comparable to some other antireflective films using organic templates. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：67 / 70

页数：4

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