A laterally resolved DLTS study of intrinsic defect diffusion in 4H-SiC after low energy focused proton beam irradiation

被引:2
作者
Lovlie, Lars S. [1 ]
Vines, Lasse [1 ]
Svensson, Bengt G. [1 ]
机构
[1] Univ Oslo, Ctr Mat Sci & Nanotechnol, N-0316 Oslo, Norway
来源
SILICON CARBIDE AND RELATED MATERIALS 2009, PTS 1 AND 2 | 2010年 / 645-648卷
关键词
intrinsic defects; carbon interstitials; migration; DLTS; TRANSIENT SPECTROSCOPY; MIGRATION;
D O I
10.4028/www.scientific.net/MSF.645-648.431
中图分类号
TB33 [复合材料];
学科分类号
摘要
4H-SiC has been irradiated with 10 keV protons and a laterally resolved DLTS study performed to study the diffusion of irradiation induced intrinsic point defects. It is found that the defects migrate on the order of hundreds of mu m laterally and carbon interstitials (C(1)) are believed to be involved in the defect formation. However, the vertical diffusion lengths are revealed to be several orders of magnitude shorter, on the order of hundreds of nm. Specifically, the Z(1,2), S(1,2) and EH(6,7) levels are found to be generated significant distances from the irradiated area, suggesting that C(1) or another highly mobile species are involved in the formation of these defects.
引用
收藏
页码:431 / 434
页数:4
相关论文
共 10 条
[1]   Long distance point defect migration in irradiated SiC observed by deep level transient spectroscopy [J].
Alfieri, G. ;
Grossner, U. ;
Monakhov, E. V. ;
Svensson, B. G. ;
Steeds, J. W. ;
Sullivan, W. .
Silicon Carbide and Related Materials 2005, Pts 1 and 2, 2006, 527-529 :485-488
[2]   Alphabet luminescence lines in 4H-SiC -: art. no. 184108 [J].
Eberlein, TAG ;
Fall, CJ ;
Jones, R ;
Briddon, PR ;
Öberg, S .
PHYSICAL REVIEW B, 2002, 65 (18) :1841081-1841084
[3]   RECOMBINATION ENHANCED DEFECT REACTIONS [J].
KIMERLING, LC .
SOLID-STATE ELECTRONICS, 1978, 21 (11-1) :1391-1401
[4]  
LOVLIE LS, IN PRESS
[5]   THEORY OF ELECTRONICALLY STIMULATED DEFECT MIGRATION IN SEMICONDUCTORS [J].
PANTELIDES, ST ;
OSHIYAMA, A ;
CAR, R ;
KELLY, PJ .
PHYSICAL REVIEW B, 1984, 30 (04) :2260-2262
[6]   Transmission electron microscope radiation damage of 4H and 6H SiC studied by photoluminescence spectroscopy [J].
Steeds, JW ;
Evans, GA ;
Danks, LR ;
Furkert, S ;
Voegeli, W ;
Ismail, MM ;
Carosella, F .
DIAMOND AND RELATED MATERIALS, 2002, 11 (12) :1923-1945
[7]  
STONEHAM AM, 1981, REP PROGR PHYS, V44, P251
[8]   Deep levels created by low energy electron irradiation in 4H-SiC [J].
Storasta, L ;
Bergman, JP ;
Janzén, E ;
Henry, A ;
Lu, J .
JOURNAL OF APPLIED PHYSICS, 2004, 96 (09) :4909-4915
[9]   OVERLAPPING ELECTRON TRAPS IN N-TYPE SILICON STUDIED BY CAPACITANCE TRANSIENT SPECTROSCOPY [J].
SVENSSON, BG ;
RYDEN, KH ;
LEWERENTZ, BMS .
JOURNAL OF APPLIED PHYSICS, 1989, 66 (04) :1699-1704
[10]  
Ziegler J. F., 2013, The Stopping and Range of Ions in Matter SRIM, DOI DOI 10.1016/J.NIMB.2010.02.091