Polarization-insensitive high-dispersion total internal reflection diffraction gratings

被引:16
作者
Marciante, JR
Hirsh, JI
Raguin, DH
Prince, ET
机构
[1] Univ Rochester, Laser Energet Lab, Rochester, NY 14623 USA
[2] Piezog Ltd, E Topsham, VT 05076 USA
[3] Aprilis Inc, Maynard, MA 01754 USA
[4] RPC Photon, Rochester, NY 14623 USA
关键词
D O I
10.1364/JOSAA.22.000299
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report the first experimental realization of total internal reflection (TIR) diffraction gratings. Performance of less than 0.7-dB insertion loss (IL) for both TE and TM polarizations and 0.5-dB polarization-dependent loss (PDL) are predicted over a 50-nm spectral bandwidth with simultaneous fabrication tolerances on the depth and the duty cycle of binary gratings of +/-5% and +/-14%, respectively. Nineteen gratings were fabricated that met these specifications, yielding IL and PDL values less than 0.6 and 0.2 dB, respectively, across the entire 50-nm bandwidth. Measurements made under the Littrow configuration resulted in high efficiency and low PDL across a 100-nm bandwidth, with up to 100% diffraction efficiency within the experimental measurement error. (C) 2005 Optical Society of America.
引用
收藏
页码:299 / 305
页数:7
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