Dislocation-interface interaction in nanoscale fcc metallic bilayers

被引:42
作者
Shao, Shuai [1 ]
Medyanik, Sergey N. [1 ]
机构
[1] Washington State Univ, Sch Mech & Mat Engn, Pullman, WA 99164 USA
关键词
Nanomaterials; Metallic composites; Interfaces; Dislocations; Atomistic simulation; Nanoindentation; EMBEDDED-ATOM METHOD; BICRYSTAL INTERFACES; DEFORMATION; MULTILAYERS; COMPOSITES; NUCLEATION; NANOINDENTATION; SIMULATIONS; MECHANISMS; STABILITY;
D O I
10.1016/j.mechrescom.2010.03.007
中图分类号
O3 [力学];
学科分类号
08 ; 0801 ;
摘要
Dislocation-interface interactions are investigated in a Ni-Cu bilayer using molecular mechanics simulations. Nanoindentation model is used to generate dislocations in the top Ni layer and study their propagation through coherent (1 1 1) fcc interface into Cu. Although dislocations do propagate through, the interface acts as a strong barrier to gliding dislocations and contributes considerably to the overall strain hardening of the nanolayered material. Mechanisms of dislocation-interface interactions are analyzed. In particular, spreading of a dissociated dislocation core at the interface and interfacial stacking fault formation are investigated along with their effect on the material strengthening. Published by Elsevier Ltd.
引用
收藏
页码:315 / 319
页数:5
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