An innovative method for preparation of sol-gel HfO2 films with high laser-induced damage threshold after high-temperature annealing

被引：10
作者：
Zhang, Miao [1 ]
Zhu, Yongqiao [1 ]
Li, Dawei [2 ]
Feng, Peizhong [1 ]
Xu, Cheng [1 ]
机构：
[1] China Univ Min & Technol, Sch Mat Sci & Engn, Xuzhou 221116, Jiangsu, Peoples R China
[2] Chinese Acad Sci, Shanghai Inst Opt & Fine Mech, Key Lab Mat High Power Laser, Shanghai 201800, Peoples R China
来源：
APPLIED SURFACE SCIENCE | 2021年 / 554卷
关键词：
Sol-gel; HfO2; films; Absorption; High temperature; Laser damage; ZNO THIN-FILMS; OPTICAL-PROPERTIES; ELECTRICAL-PROPERTIES; COATINGS; MICROSTRUCTURE; DEPOSITION; MORPHOLOGY; VISCOSITY; OXIDE;
D O I：
10.1016/j.apsusc.2021.149615
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
In this study, HfO2 films were prepared using the sol-gel method with HfCl4 as a precursor, HNO3 as a hydrolysis inhibitor and polyethylene glycol as an additive. Investigations were then made into the properties and laser damage characteristics of the films after annealing at different temperatures. The prepared films have high transmittance, low absorption and high laser-induced damage threshold (LIDT). Specifically, the LIDT of the film was as high as 31.6 J/cm(2) after annealing at 353 K, and it gradually dropped to 21.7 J/cm(2) after annealing at 573 K, indicating its strong resistance to high temperature. This study reported a novel method for preparing sol-gel HfO2 films with high LIDT and pinpointed the potential application of the films under high-temperature conditions.
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页数：7
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