Parameters required to simulate electric characteristics of SiC devices for n-type 4H-SiC

被引:62
作者
Kagamihara, S
Matsuura, H
Hatakeyama, T
Watanabe, T
Kushibe, M
Shinohe, T
Arai, K
机构
[1] Osaka Electrocommun Univ, Dept Elect Engn & Comp Sci, Osaka 5728530, Japan
[2] Toshiba Co Ltd, Ctr Corp Res & Dev, Saiwai Ku, Kanagawa 2128582, Japan
[3] Natl Inst Adv Ind Sci & Technol, Tsukuba Ctr 2, Power Elect Res Ctr, Tsukuba, Ibaraki 3058568, Japan
关键词
D O I
10.1063/1.1798399
中图分类号
O59 [应用物理学];
学科分类号
摘要
In order to obtain some of the parameters required to simulate the electric characteristics of silicon carbide (SiC) power electronic devices in a wide temperature range from startup temperatures (less than or equal to30degreesC) to steady-operation temperatures (greater than or equal to200degreesC), we discuss the dependence of the two donor levels on the total donor density (N-D) as well as the dependence of the electron mobility on the total impurity density (N-imp) and operating temperature (T) in the n-type 4H-SiC. The temperature-dependent electron concentration n(T) and electron mobility mu(n)(T) in the n-type 4H-SiC epilayers with several nitrogen-doping densities are obtained from the Hall-effect measurements. By the graphical peak analysis method (free carrier concentration spectroscopy: FCCS) without any assumptions regarding the donor species, the two types of donor species are detected from n(T). Moreover, the energy level and density of each donor species are determined by the FCCS. Using these results, we obtain the parameters with which the dependence of each donor level on N-D can be simulated. Using mu(n)(T) at T>250 K, moreover, we obtain the parameters with which the dependence of the electron mobility on N-imp and T can be simulated. (C) 2004 American Institute of Physics.
引用
收藏
页码:5601 / 5606
页数:6
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