Development of a cluster tool and analysis of deposition of silicon oxide by TEOS/O-2 PECVD

被引：10
|
作者：
Morimoto, NI [1 ]
Swart, JW [1 ]
机构：
[1] EPUSP,PEE,LSI,BR-61548 SAO PAULO,BRAZIL
来源：
RAPID THERMAL AND INTEGRATED PROCESSING V | 1996年 / 429卷
关键词：
D O I：
10.1557/PROC-429-263
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：263 / 268
页数：6
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