Chemical bath deposited ZnO thin films

被引：0

作者：

Sharma, AK ^{[1
]}

Patil, PS

Sharma, TP

机构：

[1] Shivaji Univ, Dept Phys, Kolhapur 416004, Maharashtra, India

[2] Ch Charan Singh Univ, Dept Phys, Meerut 250005, Uttar Pradesh, India

来源：

BULLETIN OF ELECTROCHEMISTRY | 2000年 / 16卷 / 08期

关键词：

zinc oxide thin films; chemical bath deposition; X-ray diffraction;

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Thin films of ZnO have been prepared by a simple and inexpensive chemical bath deposition technique. The starting solution was prepared from Zinc acetate. Thin films were annealed at 773 K for 2 hours. The resultant films mere of good quality. Structural, electrical and optical properties of the thin films mere carried out.

引用

页码：367 / 369

页数：3

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