Interplay between gas adsorption and dislocation structure on a metal surface

被引：10
作者：
de la Figuera, J
Carter, CB
Bartelt, NC
Hwang, RQ
机构：
[1] Sandia Natl Labs, Livermore, CA 94551 USA
[2] Univ Minnesota, Dept Chem Engn & Mat Sci, Minneapolis, MN 55455 USA
来源：
SURFACE SCIENCE | 2003年 / 531卷 / 01期
关键词：
surface defects; surface stress; corrosion; scanning tunneling microscopy; atomistic dynamics; ruthenium; copper;
D O I：
10.1016/S0039-6028(03)00401-1
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The influence of oxygen and sulfur on the dislocation patterns of the strained two monolayer Cu film on Ru was observed by scanning tunneling microscopy. Both oxygen and sulfur adsorption lead to the formation of vacancies that aggregate over existing dislocations in the film, thereby modifying the dislocation structure. With increasing adsorbate coverage the overall dislocation structure and pattern are transformed. The atomic mechanisms and general nature of this transformation can be explained in terms of generic dislocation reactions. This interpretation is also supported by atomistic simulations. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：29 / 38
页数：10
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