Long-term follow-up of toenail onychomycosis caused by dermatophytes after successful treatment with systemic antifungal agents

被引:92
作者
Piraccini, Bianca Maria [1 ]
Sisti, Andrea [1 ]
Tosti, Antonella [1 ]
机构
[1] Univ Bologna, Div Dermatol, Dept Internal Med Geriatr & Nephrol, I-40138 Bologna, Italy
关键词
amorolfine nail lacquer; dermatophytes; itraconazole; systemic antifungal; terbinafine; toenail onychomycosis; TRICHOPHYTON-RUBRUM; RISK;
D O I
10.1016/j.jaad.2009.04.062
中图分类号
R75 [皮肤病学与性病学];
学科分类号
100206 ;
摘要
Background: Recurrences (relapse or reinfection) of onychomycosis are not uncommon, with percentages reported in Various studies ranging from 10% to 53%. Objective: we sought to determine the prevalence of long-term recurrences of toenail onychomycosis caused by dermatophytes Cured after systemic antifungal treatment with terbinafine (T) or itraconazole (1) and identify risk factors for recurrences. Methods: This 7-year prospective study, started in 2000 and ended in 2007, included 73 patients periodically followed after successful treatment of toenail onychomycosis using either T; 250 mg daily (59 patients), or 1; 400 mg daily, for 1 week per month (14 patients). Patients were evaluated every 6 months,. with clinical and mycological evaluations being performed. Results: Twelve of 73 patients (16.4%) developed a recurrence of onychomycosis a mean dine of 36 months after successful treatment. These included 5 of the 74 patients (35.7%) who had taken I and 7 of the 59 (11.9%) who had taken T (P = .046). Limitations: The number of patients treated with T (59 patients) was more than that for I (14 patients). Conclusion: The administration of systemic T to treat the first episode of onychomycosis may provide better long-term success than I in those patients with a complete response. Other factors including the presence of predisposing factors, use of nail lacquer as a prophylactic treatment, and the dermatophyte strain isolated were not significantly related to relapse. (J Am Acad Dermatol 2010;62:411-4.)
引用
收藏
页码:411 / 414
页数:4
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