Surface X-ray diffraction study ion the initial oxidation of NiAl(100)

被引:46
作者
Stierle, A
Formoso, V
Comin, F
Franchy, R
机构
[1] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[2] Forschungszentrum Julich, Inst Grenzflachenforsch & Vakuumphys, D-52425 Julich, Germany
关键词
alloys; aluminium oxide; growth; insulating films; low index single crystal surfaces; metal-insulator interfaces; oxidation; single crystal surfaces; X-ray scattering; diffraction; and reflection;
D O I
10.1016/S0039-6028(00)00719-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The oxidation behavior of NiAl(100) surfaces was studied using surface X-ray diffraction. After oxidation of the preferentially Ni-terminated surface at 950 degreesC for 500 s at 2 x 10(-6) mbar O-2, the formation of epitaxial Al2O3, in a (2 x 1) superstructure was observed. Along the (2 x 1.) superstructure reciprocal lattice rods, two different modulation periods could be detected. The shorter period arises from the growth of 2 nm high theta -Al2O3 oxide islands in monoclinic structure, the longer period from a 0.76 nm thick Al2O3 layer. This layer exhibits a theta -Al2O3-like structure with strongly modified Al ion positions at the surface and at the metal/oxide interface. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:85 / 97
页数:13
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